Solid State Amorphous Reaction under High Pressure

The X-ray diffraction of the Ni50Ti50 multilayer samples annealed at low temperature and under various pressures is reported in this paper, in which the effect of pressure on the solid state amorphous reaction is considered for the first time. Based on the effects of pressure on the reaction thermodynamics and kinetics, the authors suggest that the failure of the reaction under the pressure above 2 GPa could be attributed to the high pressure suppression of the fast atomic diffusion. It is also proposed that the suppressed diffusion in the amorphization of the Ni-Ti series solid state reaction could be described by the B type kinetical model for thin film diffusion.